If LNEYA® multi channel chillers do not meet your application
we can tailor a suitable solution for you.
LNEYA®에 문의하세요
요청을 제출하시면 24시간 이내에 연락드리겠습니다.
전체 방송국 검색
Temp range -45℃~90℃ Temp accuracy ±0.1℃
Multi channel chillers Video
모델 | FLTZ-203W-2T | |
파이프라인 | channel 1 | channel 2 |
온도 범위 | -20℃~+90℃ | -20℃~+90℃ |
냉각 용량 | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | |
난방 용량 | 4kW@-10℃ | 4kW@-10℃ |
열 전도성 매체 유량 | 2kW | 2kW |
Heat conducting medium connection size | 20L/min 0.5MPa | 20L/min 0.5MPa |
Heat transfer interface | ZG3/4 | ZG3/4 |
주변 온도 | 10~35℃ | 10~35℃ |
주변 습도 | 30~70% | 30~70% |
냉각수 온도 | 15~20℃ | 15~20℃ |
Cooling water flow rate | 20L/min | 20L/min |
무게 | 400kg | |
치수 cm | 50*90*160 |
모델 | FLTZ-406W/ETCU-015W | |
파이프라인 | channel 1 | channel 2 |
온도 범위 | -45℃~+40℃ | +10℃~+80℃ |
냉각 용량 | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | |
난방 용량 | 11kW@-20℃ 5kW@-40℃ |
13kW@+10℃ |
열 전도성 매체 유량 | 2kW | 6kW |
Heat conducting medium connection size | 17L/min 0.7MPa | 17L/min 0.7MPa |
Heat transfer interface | ZG3/4 | ZG3/4 |
주변 온도 | 10~35℃ | 10~35℃ |
주변 습도 | 30~70% | 30~70% |
냉각수 온도 | 15~20℃ | 15~20℃ |
Cooling water flow rate | 40L/min | 20L/min |
무게 | 550kg | |
치수 cm | 60*100*185 |
모델 | FLTZ-203W/2T 듀얼 시스템 | FLTZ-305W/2T 듀얼 시스템 | FLTZ-406W/2T 듀얼 시스템 | |||
온도 범위 | -20℃~90℃ | -30℃~90℃ | -45℃~90℃ | |||
온도 제어 정확도 | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | |||||
열 전도성 매체 유량 | 최대 15~45L/min 6bar | |||||
난방 용량 | 2.5kW | 2.5kW | 2.5kW | 2.5kW | 3.5kW | 3.5kW |
냉각 용량 | 3kW @-15℃ | 3kW @-15℃ | 5kW @-15℃ | 5kW @-15℃ | 2.5kW @ -35℃ | 2.5kW @ -35℃ |
내부 순환 체액 용량 | 5L | 5L | 8L | 8L | 8L | 8L |
냉각수 인터페이스 | 20℃에서 50L/min | 20℃에서 600L/min | 20℃에서 50L/min |
모델 | FLTZ-203W/ETCU-008W | ||
파이프라인 | channel 1 | channel 2 | channel 3 |
온도 범위 | -10℃~+60℃ | +30℃~+80℃ | -10℃~+80℃ |
Temperature stability | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | ||
냉각 용량 | 4kW@-10℃/21kW@+20℃ | 6 kW@+30℃ | 3kW@-10℃ |
난방 용량 | 4kW | 4.5+6kW | 3kW |
열 전도성 매체 유량 | 17L/min 0.7MPa | 17L/min 0.7MPa | 17L/min 0.7MPa |
Heat conducting medium connection size | ZG3/4 | ZG3/4 | ZG3/4 |
주변 온도 | 10~35 ℃ | 10~35 ℃ | 10~35 ℃ |
주변 습도 | 30~70% | 30~70% | 30~70% |
Cooling water flow rate | 15~20℃ | 15~20℃ | 15~20℃ |
냉각수 온도 | 30L/min@15~20℃ | 15L/min@15~20℃ | 15L/min@15~20℃ |
회로 차단기 | 100A | ||
무게 | 600kg | ||
치수 cm | 60*100*170 |
모델 | FLT-215W/ETCU-015W/ETCU-008W | ||
파이프라인 | channel 1 | channel 2 | channel 3 |
온도 범위 | -20℃~+50℃ | +30℃~+100℃ | +30℃~+40℃ |
Temperature stability | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | ||
냉각 용량 | 15kW@-10℃ | 13kW@PCW+15℃ | 8kW@PCW+10℃ |
난방 용량 | 2kW | 6kW | 펌프 열 손실 |
열 전도성 매체 유량 | 30L/min 0.85MPa | 30L/min 0.85MPa | 20L/min 0.8MPa |
Heat conducting medium connection size | ZG3/4 | ZG3/4 | ZG3/4 |
주변 온도 | 10~35 ℃ | 10~35 ℃ | 10~35 ℃ |
주변 습도 | 30~70% | 30~70% | 30~70% |
Cooling water flow rate | 15~20℃ | 15~20℃ | 15~20℃ |
냉각수 온도 | 30L/min@15~20℃ | 15L/min@15~20℃ | 15L/min@15~20℃ |
회로 차단기 | 75A | ||
무게 | 600kg | ||
치수 cm | 60*100*170 |
Multi-channel Chiller‘s Applications
FLTZ multi-channel chillers are widely used in the semiconductor industry due to their advantages such as precise temperature control, independent circuit management, and rapid cooling. The application scenarios of semiconductor chillers include wafer manufacturing, packaging testing, photolithography, etching, CVD/PVD deposition, cleaning processes, etc.
The high-energy particle beam generated during ion implantation can cause local high temperatures. The process chiller can quickly remove heat to prevent thermal damage to the wafer.
During plasma etching (RIE, ICP, etc.), the chamber and electrodes need to be strictly temperature controlled to ensure etching uniformity. The chiller can provide a stable temperature environment for etching equipment and reduce process deviations
In the packaging process of BGA, CSP, FCBGA, etc., the temperature control of welding and packaging materials affects reliability
CVD (such as LPCVD, PECVD) and PVD (such as sputtering coating) are used for thin film deposition, and the temperature control of the chamber and substrate affects the quality of the film.
The exposure system, optical lenses, laser light sources, and mask plates of the photolithography machine require precise temperature control to ensure pattern accuracy.
Used to help maintain deionized water within a specific temperature range to remove photoresist residues, metal contamination and particulate matter.
Why do you need FLTZ multi channel chillers?
Why Choose LNEYA®?
If LNEYA® multi channel chillers do not meet your application
we can tailor a suitable solution for you.
LNEYA®에 문의하세요
요청을 제출하시면 24시간 이내에 연락드리겠습니다.
위챗/전화
18914253067
86 13912479193
이메일 주소
sales@cnzlj.com