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Multi channel chillers

Dual channel chiller or Three channel chiller for semiconductor industry

빠른 견적을 받으세요

  • There are two or more channels with the same/different specifications in one housing;
  • The temperature of two fluid channel systems can be controlled separately by one host;
  • One power supply system realizes the temperature control of 2 channels, reducing the wiring work time;
  • By controlling the variable frequency compressor, variable frequency fan, and electronic expansion valve at the same time, it can still maintain good temperature stability when the heat load fluctuates;
  • Use a pump without mechanical seal. There is no need to regularly check the pump for leakage and replace the mechanical seal.

Our FLTZ multi channel chiller lineup includes standard dual-channel and three-channel models. For specialized applications, we offer custom solutions tailored to your specific needs, including channel count, control parameters, and equipment size.  

Contact our industrial chiller sales team to request a standard product catalog or customize a process chiller.

모델 FLTZ-203W-2T
파이프라인 channel 1 channel 2
온도 범위 -20℃~+90℃ -20℃~+90℃
냉각 용량 ±0.1℃(Customizable temperature control accuracy of ±0.01°C.)
난방 용량 4kW@-10℃ 4kW@-10℃
열 전도성 매체 유량 2kW 2kW
Heat conducting medium connection size 20L/min 0.5MPa 20L/min 0.5MPa
Heat transfer interface ZG3/4 ZG3/4
주변 온도 10~35℃ 10~35℃
주변 습도 30~70% 30~70%
냉각수 온도 15~20℃ 15~20℃
Cooling water flow rate 20L/min 20L/min
무게 400kg
치수 cm 50*90*160
모델 FLTZ-406W/ETCU-015W
파이프라인 channel 1 channel 2
온도 범위 -45℃~+40℃ +10℃~+80℃
냉각 용량 ±0.1℃(Customizable temperature control accuracy of ±0.01°C.)
난방 용량 11kW@-20℃
5kW@-40℃
13kW@+10℃
열 전도성 매체 유량 2kW 6kW
Heat conducting medium connection size 17L/min 0.7MPa 17L/min 0.7MPa
Heat transfer interface ZG3/4 ZG3/4
주변 온도 10~35℃ 10~35℃
주변 습도 30~70% 30~70%
냉각수 온도 15~20℃ 15~20℃
Cooling water flow rate 40L/min 20L/min
무게 550kg
치수 cm 60*100*185
모델 FLTZ-203W/2T 듀얼 시스템 FLTZ-305W/2T 듀얼 시스템 FLTZ-406W/2T 듀얼 시스템
온도 범위 -20℃~90℃  -30℃~90℃ -45℃~90℃
온도 제어 정확도 ±0.1℃(Customizable temperature control accuracy of ±0.01°C.)
열 전도성 매체 유량 최대 15~45L/min 6bar
난방 용량 2.5kW 2.5kW 2.5kW 2.5kW 3.5kW 3.5kW
냉각 용량 3kW @-15℃ 3kW @-15℃ 5kW @-15℃ 5kW @-15℃ 2.5kW @ -35℃ 2.5kW @ -35℃
내부 순환 체액 용량 5L 5L 8L 8L 8L 8L
냉각수 인터페이스 20℃에서 50L/min 20℃에서 600L/min 20℃에서 50L/min

모델 FLTZ-203W/ETCU-008W
파이프라인 channel 1 channel 2 channel 3
온도 범위 -10℃~+60℃ +30℃~+80℃ -10℃~+80℃
Temperature stability ±0.1℃(Customizable temperature control accuracy of ±0.01°C.)
냉각 용량 4kW@-10℃/21kW@+20℃ 6 kW@+30℃ 3kW@-10℃
난방 용량 4kW 4.5+6kW 3kW
열 전도성 매체 유량 17L/min 0.7MPa 17L/min 0.7MPa 17L/min 0.7MPa
Heat conducting medium connection size ZG3/4 ZG3/4 ZG3/4
주변 온도 10~35 ℃ 10~35 ℃ 10~35 ℃
주변 습도 30~70% 30~70% 30~70%
Cooling water flow rate 15~20℃ 15~20℃ 15~20℃
냉각수 온도 30L/min@15~20℃ 15L/min@15~20℃ 15L/min@15~20℃
회로 차단기 100A
무게 600kg
치수 cm 60*100*170
모델 FLT-215W/ETCU-015W/ETCU-008W
파이프라인 channel 1 channel 2 channel 3
온도 범위 -20℃~+50℃ +30℃~+100℃ +30℃~+40℃
Temperature stability ±0.1℃(Customizable temperature control accuracy of ±0.01°C.)
냉각 용량 15kW@-10℃ 13kW@PCW+15℃ 8kW@PCW+10℃
난방 용량 2kW 6kW 펌프 열 손실
열 전도성 매체 유량 30L/min 0.85MPa 30L/min 0.85MPa 20L/min 0.8MPa
Heat conducting medium connection size ZG3/4 ZG3/4 ZG3/4
주변 온도 10~35 ℃ 10~35 ℃ 10~35 ℃
주변 습도 30~70% 30~70% 30~70%
Cooling water flow rate 15~20℃ 15~20℃ 15~20℃
냉각수 온도 30L/min@15~20℃ 15L/min@15~20℃ 15L/min@15~20℃
회로 차단기 75A
무게 600kg
치수 cm 60*100*170

FLTZ multi-channel chillers are widely used in the semiconductor industry due to their advantages such as precise temperature control, independent circuit management, and rapid cooling. The application scenarios of semiconductor chillers include wafer manufacturing, packaging testing, photolithography, etching, CVD/PVD deposition, cleaning processes, etc.

Ion implantation

The high-energy particle beam generated during ion implantation can cause local high temperatures. The process chiller can quickly remove heat to prevent thermal damage to the wafer.

Etching

During plasma etching (RIE, ICP, etc.), the chamber and electrodes need to be strictly temperature controlled to ensure etching uniformity. The chiller can provide a stable temperature environment for etching equipment and reduce process deviations

Chip packaging

In the packaging process of BGA, CSP, FCBGA, etc., the temperature control of welding and packaging materials affects reliability

PVD/CVD

CVD (such as LPCVD, PECVD) and PVD (such as sputtering coating) are used for thin film deposition, and the temperature control of the chamber and substrate affects the quality of the film.

포토리소그래피

The exposure system, optical lenses, laser light sources, and mask plates of the photolithography machine require precise temperature control to ensure pattern accuracy.

Wet cleaning

Used to help maintain deionized water within a specific temperature range to remove photoresist residues, metal contamination and particulate matter.

If you need independent temperature control for multiple different equipment or processes, and don’t want to buy multiple independent chillers, then FLTZ multi-channel chillers are a very ideal choice.

With the help of the Internet, we have built a global consulting, sales and service network. We have served more than 30,000 customers worldwide and have more than 90 patents.

Our chillers have been selected by more than 100 university laboratory projects around the world and exported to more than 20 countries. We have agents in various European countries and regions such as Singapore, Malaysia, Japan, South Korea, Qatar, Middle Eastern countries, Australia, the Netherlands, Spain and the United States.

We can customize it for you. For example, cooling capacity, power supply, size
We can customize the voltage and phase of the chiller according to your needs.

Generally, our multi-channel water dispenser for you includes two types: dual channel and triple channel,
If you have other channel requirements, you can contact us for customization.

LNEYA not only provides temperature control systems for semiconductor chillers, but also offers gas coolers for testing in downstream processes, and even provides temperature chambers.

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