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반도체 제조 공정 중 멀티채널 냉각기가 필요한 공정은 무엇입니까? 왜 필요한가요?

Chemical Vapor Deposition (CVD): In the CVD process, a multi-channel chiller is used to cool the reaction chamber walls, heat exchangers, and gas preheating exchangers to maintain stable reaction chamber temperature, ensuring precise control of film thickness, uniformity, and chemical reactions.

Etching and etching: Both dry etching and wet etching require precise temperature control. The multi-channel chiller ensures the temperature of the etching equipment and chemical bath, which affects the etching rate, selection ratio, and graphic accuracy.

Ion implantation: The ion source and target chamber need to be cooled by a chiller to control temperature, prevent overheating from affecting ion energy dispersion, and ensure the accuracy of injection depth and dosage.

Heat treatment: such as oxidation, diffusion, annealing, nitriding, multi-channel chiller controls furnace temperature to ensure uniform temperature, affecting diffusion rate, activation, and impurity distribution.

Testing equipment: such as probe testing and aging testing benches, multi-channel chillers control the testing environment temperature to ensure equipment stability and reproducibility of test results, especially for high or low temperature testing.

Why do need a multi-channel chiller?

Temperature control accuracy: Multi channel design can more accurately control the temperature of each area, reduce temperature fluctuations, and ensure process consistency.

High heat load management: Semiconductor manufacturing generates a large amount of heat energy, and multi-channel can effectively handle a large amount of heat load to ensure equipment operation safety and efficiency.

Flexibility: Multiple channels can be independently adjusted to meet specific temperature requirements of different processes or equipment sections, increasing process flexibility.

Reliability: Redundant hot backup, single channel failure does not affect overall operation, improves system stability, and reduces downtime.